Away

The title gestures toward absence rather than depiction, and the medium suits that orientation. Stone lithography paired with chine-collé gives Yokoo a soft tonal register on the primary support and an inset of thinner paper, often a Japanese fiber sheet, laminated into the print during pressing. The technique permits two simultaneous grounds within one image: the heavier base sheet and a localized, lighter field that reads as a different surface. For a subject named Away—departure, distance, withdrawal—the chine-collé inset operates as a literalization of the theme, a separate paper occupying the image as a region set apart. The print belongs to the 2018 group in which Yokoo's practice had begun to extend into installation and site-responsive work while keeping lithography as its disciplinary core. Among these later prints the imagery moves further from the explicit architectural vocabulary of 2017 toward atmospheric and conceptual subjects, consistent with his ongoing concern with traces, thresholds, and the bodily memory of what is no longer present.